LayTec
Gesellschaft für in-situ und Nano-Sensorik mbH
Helmholtzstr. 13-14
D-10587 Berlin
Germany
Phone: |
+49 30 39 800 800 |
Fax: |
+49 30 31 80 82 37 |
eMail: |
info@laytec.de |
Dr. Thomas Zettler, President
LayTec GmbH Berlin
- Founded: 1999
- Employees: 22
- Installations: 140 sensors at
epitaxy customers worldwide
- Distributors and Reps in
Japan, Korea, Taiwan, Europe and USA

As a leader in the field of in situ epitaxy sensors, LayTec offers a wide range of real-time monitoring tools for MOCVD, MBE and other thin-film processes. LayTec's EpiRAS® 2000 TT (True Temperature) is the most advanced multi-wafer in situ sensor available today and EpiTT is the first choice for LED production world-wide. Our sophisticated real-time monitoring tools measure epitaxy growth properties such as growth rate, layer thickness, doping levels, ternary material composition, and wafer surface temperature with extreme precision - already during the deposition process. A brand new curvature sensor EpiCurve, which combines true temperature, growth rate and wafer bowing measurements, complemented our product range recently.
The enhanced knowledge of the epitaxy growth process achieved through in situ monitoring dramatically reduces development cycles and enables superior methods of quality control. This technology finds its home typically in the field of optoelectronic (LED, Laser) and electronic devices (HBT, HEMT).

EpiTT
- fast emission and reflectance measurements at two wavelength
- wafer selective measurements of true surface temperature via emissivity corrected pyrometry (ECP)
- from one to more than 20 wafers
- wafer selective growth rate fits using virtual layer approach
EpiCurve
- wafer selective bowing curvature measurement
- full and seamless integration in EpiTT hard- and software environment
- fast emission and reflectance measurements at two wavelength
- wafer selective measurements of true surface temperature via emissivity corrected pyrometry (ECP)
- from one to more than 20 wafers
- wafer selective growth rate fits using virtual layer approach
EpiRAS® TT
- measurement of reflectance anisotropy spectroscopy
- normalized reflectance spectroscopy
- true surface temperature measurement (ECP)
- composition monitoring
- surface and interface stoichiometry
- surface roughness
- doping concentration

- to contact research institutes and manufacturing companies for further cooperation and development of our products
- to meet partners for distribution cooperation, sales and marketing as well as technical support on site