Development, production and sales of photo- and e-beam resists including corresponding process-chemicals. Manufacture of small quantities up to the production of large batches.

Special preparation according to customer's request with competent consultation.

Processing of numerous research and development subjects and preparation of experimental samples.

Photoresists

• Positive, Negative, Image reversal
• Exposure by g-line, i-line, Deep-UV (250 nm)
• Lift-off-application
• Thick resists for micro system technique
• Top surface imaging resists

E-Beamresists

• Positive, Negative, Mix & match
• PMMA-Resists
• Chemical Amplified Resists
• Analogue E-Beamresists
• Resolution down to 10 nm

Special resists

• Alkali- and etch stable resists
• Thermal stable resists
• Protective Coatings
• Polyimide

The Allresist Company looks in China for customers and for partnership in the field of resist technology.

The main focus of the resist developments is the optimization of positive and negative photoresists for i-line and g-line. A technology transfer of the resist manufacture and quality management system is possible in future.

www.allresist.de